Event Detail

ALD for Industry - 2nd Workshop and Tutorial

Atomic Layer Deposition (ALD) is used to deposit ultrathin and highly conformal thin films. ALD is unique in the sense that it employs sequential self-limiting surface reactions for growth in the monolayer thickness regime. According to market estimates the equipment market alone is currently at an annual revenue of US$ 1.5 - 1.7 billion (2017) and it is expected to double in the next 4- 5 years.

In a European context ALD was invented independently twice in Europe (Russia & Finland) and since the last 15 years Germany has grown to become one of the strongest European markets for ALD in R&D, chemicals, equipment and end users. Here, Dresden and Saxony are unique ALD hotspots due to a strong semiconductor and equipment industry.

The event will focus on the current markets for ALD, besides the leading edge semiconductor industry, applications in MEMS and Sensors, Display, Lightning, Barriers and Photovoltaics will be addressed. An exhibition and a cleanroom tour will accompany the event.


  • Semiconductor 
  • MEMS and Sensors Display
  • Lightning
  • Barriers 
  • Photovoltaics


Dr. Katrin Ferse
Europäische Forschungsgesellschaft Dünne Schichten e. V.
Tel. +49 351 871 8374
E-Mail: ferse@efds.org 

Date and Location

21. - 22. March 2018

HYPERION Hotel Dresden am Schloss
Schloßstraße 16, 01067 Dresden

Further information

ALD for Industry - 2nd Workshop and Tutorial
ALD LAB Saxony

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